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filingDate 1998-11-16-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationDate 2001-03-26-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber KR-20010024652-A
titleOfInvention Low pressure vapor phase deposition of organic thin films
abstract The present invention relates to a method for forming an organic thin film on a substrate (58), which provides a plurality of organic precursors (14, 48) in the gas phase and a plurality of organic at pressures lower than atmospheric. Reacting the precursors 14, 48. Also included are thin films formed by the method and apparatus used to perform the method. The method is suitable for the formation of organic light emitting devices and other display-related techniques.
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