| abstract |
The vacuum vapor deposition apparatus includes a vacuum chamber having a plurality of steam sources and a heater that heats the steam sources, thereby achieving vacuum vapor deposition on the surface of at least one substrate in the vacuum chamber. At least one steam source uses organic materials. The hot wall surrounding the vapor source and the space where the vapor source and the substrate face each other is heated to a temperature at which organic materials are not deposited and do not decompose. By heating this vapor source while the vapor source and the substrate move relative to each other, organic materials are vapor deposited on the surface of the substrate. |