http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2008286461-A1

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filingDate 2008-05-15-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_1bd6a81ceb0e74254432b33ca2001101
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publicationDate 2008-11-20-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber US-2008286461-A1
titleOfInvention Vacuum evaporation method
abstract The vacuum evaporation method provides a heating element between an evaporation source of a film-forming material and a substrate; and forms a phosphor layer of an alkali halide-based phosphor on a surface of said substrate by vacuum evaporation while causing the heating element to generate heat at a temperature t (° C.) satisfying Formula (1): n T− 200≦ t<T   (1) n where T is a boiling point (° C.) of the film-forming material. This method is capable of using the film-forming material making up the phosphor layer with higher efficiency owing to a heating element while preventing the substrate and the phosphor layer from being adversely affected by heat from the heating element.
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priorityDate 2007-05-17-04:00^^<http://www.w3.org/2001/XMLSchema#date>
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