| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_be055db3c1a09879df07379ba969e223 |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-7682 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02216
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02282
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L23-52
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02126 |
| classificationIPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-768
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-316 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B05D7-24
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L23-52
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08G77-18
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08G77-08
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-312
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-473
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C01B33-12
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09D183-00 |
| filingDate |
2004-03-09-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate |
2007-07-03-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_4cdd139ea6e212b050c54fc6f2246ed9
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_a2d79dc0e263f8077eef443959bb3dce
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_f0340aeb72bd67e0895463e28efa2456
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_f82ab9ba8f0dd92eec8dbaba9fba02d8 |
| publicationDate |
2007-07-03-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
US-7239018-B2 |
| titleOfInvention |
Composition for forming a porous film prepared by hydrolysis and condensation of an alkoxysilane using a trialkylmethylammonium hydroxide catalyst |
| abstract |
Provided is a composition formed by hydrolysis and condensation composition of the alkoxysilane, the composition comprising a reduced amount of metallic and halogen impurities and being applicable as electronic material. Also provided is an insulating film having low dielectric constant produced by applying the composition and sintering it. More specifically, a method for manufacturing a composition for forming a film, comprising a step of hydrolysis and condensation of alkoxysilane or a partial hydrolysis product of the alkoxysilane in an organic solvent in the presence of trialkylmethylammonium hydroxide as catalyst, wherein the alkoxysilane is selected from the groups consisting of compounds represented by formulae (1) to (4) below, and the trialkylmethylammonium hydroxide is represented by formula (5) below. Provided are a composition for forming a film obtained by the method, and a low dielectric constant film having low metallic and halogen impurities, the film produced by applying the composition for forming a film on a substrate and sintering it. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8257528-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2010040895-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8784985-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2014011019-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2010040893-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8277600-B2 |
| priorityDate |
2003-03-10-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |