abstract |
PROBLEM TO BE SOLVED: To form a coating film having an appropriate uniform thickness as a material for an interlayer insulating film in a semiconductor device and the like, to have excellent storage stability, to obtain a dielectric constant and leakage of the coating film. A film-forming composition having excellent current characteristics. (A-1) Compound represented by formula (1) (R 1 represents a hydrogen atom, a fluorine atom or an organic group, and R 2 represents an organic group.) And (A-2) a compound represented by the formula (2) (R 3 , R 4 , R 5 and R 6 are an organic group, R 7 is an oxygen atom or — (CH 2) n —, n is 1 to 6, d is 0 or 1 Is shown. ) Hydrolysates and condensates of compounds selected from (B) solvents represented by formula (3) (R 8 and R 9 are a hydrogen atom, an alkyl group or CH 3 CO- is shown, and e is 1-2. And a propylene glycol content of 10,000 ppm or less. |