| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_268be9afa00cf55b5aa72b1612151ecb
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_97d6b5b34a491fbcc206402ae3a381c4
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_25f3c4db422d441db49302e8fc79e1b3
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_88d7587e5acee6b60ed1c0358cde6a9f |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-16
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-30
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0397
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0392
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-091
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-028
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-039
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-38
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-40
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-20
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-168
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-322
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-2041
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-26
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0045
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-004
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0046
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-027 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-028
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 |
| filingDate |
2006-07-25-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate |
2014-10-28-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_5d7f3f8e9e1e13792bea11bfbc8ee712
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_c329c1f2121b6521750069eac1b36bb3
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_9070dbc6b1b7c801b3950c9eaba4e439 |
| publicationDate |
2014-10-28-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
US-8871421-B2 |
| titleOfInvention |
Positive resist composition and method of pattern formation with the same |
| abstract |
A positive resist composition comprising: (A) a resin which comes to have an enhanced solubility in an alkaline developing solution by an action of an acid; (B) a compound which generates an acid upon irradiation with actinic rays or a radiation; (C) a fluorine-containing compound containing at least one group selected from the groups (x) to (z); and (F) a solvent, and a method of pattern formation with the composition: (x) an alkali-soluble group; (y) a group which decomposes by an action of an alkaline developing solution to enhance a solubility in an alkaline developing solution; and (z) a group which decomposes by an action of an acid. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2011003257-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10678132-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2021341839-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9541831-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11703760-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9835945-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2015185609-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2017003590-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10180627-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9846360-B2 |
| priorityDate |
2005-07-26-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |