| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_268be9afa00cf55b5aa72b1612151ecb |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S430-114
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S430-106
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S430-146 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-0274
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0046
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0045
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-039
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0397
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0392
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-2041
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-322
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07C69-54
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F214-18
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F220-22
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F220-26
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0395 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-00 |
| filingDate |
2005-07-07-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate |
2009-05-12-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_817f940401b789132740205f97c4aa0e
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_5ddc38583dc3b6dfc1c92cfb863307e0 |
| publicationDate |
2009-05-12-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
US-7531287-B2 |
| titleOfInvention |
Positive type resist composition for use in liquid immersion exposure and a method of forming the pattern using the same |
| abstract |
A positive type resist composition for use in liquid immersion exposure comprises: (A) a resin having a monocyclic or polycyclic cycloaliphatic hydrocarbon structure, the resin increasing its solubility in an alkali developer by an action of acid; (B) a compound generating acid upon irradiation with one of an actinic ray and a radiation; (C) an alkali soluble compound having an alkyl group of 5 or more carbon atoms; and (D) a solvent. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8916331-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9541831-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8697329-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2007231741-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8871421-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9904169-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9057952-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9846360-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2007178405-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9261783-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2008171287-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2012115085-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9835945-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/EP-3079015-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/EP-3040776-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9086628-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2012171868-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8697903-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9760010-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8663898-B2 |
| priorityDate |
2004-07-07-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |