| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_fcc0b66123940d1b32783569ebfa2d45 |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S430-115
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S430-111
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S430-108
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S430-106 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0392
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0395 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-38
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03C1-73
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-36
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-30
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-20 |
| filingDate |
2002-09-30-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate |
2006-08-08-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_fc1064e818258926814023e4c9fd0dec
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_bdf054164a1595eea9369970ba518a6a
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_116521ed37606a66f905383757bab87c
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_30a39e540e419bb09c6cc76ad65e7dc9
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_eeb8347c5fc8eee13032379f9def6962 |
| publicationDate |
2006-08-08-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
US-7087356-B2 |
| titleOfInvention |
193nm resist with improved post-exposure properties |
| abstract |
Acid-catalyzed positive resist compositions which are imageable with 193 nm radiation and/or possibly other radiation and are developable to form resist structures of improved development characteristics and improved etch resistance are enabled by the use of resist compositions containing imaging polymer component comprising an acid-sensitive polymer having a monomeric unit with a pendant group containing a remote acid labile moiety. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9465292-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9316912-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8039197-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9798235-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2009181320-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2009253075-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2006008736-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/DE-112011100086-T5
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2011089033-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8828643-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2009181319-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9703196-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8426109-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-7531287-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2009181323-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8034533-B2 |
| priorityDate |
2002-09-30-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |