| abstract |
A radiation-sensitive resin composition which is useful as a chemically amplified resist in microfabrication with various radiations including far ultraviolet rays such as KrF excimer laser and ArF excimer laser. The composition comprises [A] a resin comprising repeating units represented by the general formula(I-1), [B] a radiation-sensitive acid generator (such as 1-(4-n-butoxynaphthyl)tetrahydrothiophenium nonafluoro-n -butanesulfonate), and, if necessary, [C] an acid diffusion controller (such as phenylbenzimidazole). |