| abstract |
(57) [Problem] To provide a positive resist composition with few problems of development defects. (A) A fluorine group containing a structure in which a fluorine atom is substituted on the main chain and / or side chain of a polymer skeleton, and having a group that decomposes by the action of an acid and increases the solubility in an alkali developer. A positive resist composition comprising a resin, (B) a compound that generates acid upon irradiation with actinic rays or radiation, and (D) a nitrogen-containing compound containing at least one fluorine atom. |