| abstract |
A resist composition suitable for immersion exposure and a resist pattern forming method using the resist composition are provided. The structural unit (f1) containing a base dissociable group and the following general formula (f2-1) [wherein W is a group containing a polycyclic aliphatic cyclic group. A fluorine-containing polymer compound (F1) having a structural unit (f2) represented by formula (I), a base component (A) whose solubility in an alkaline developer is increased by the action of an acid, and an acid generated upon exposure. A positive resist composition for immersion exposure, comprising an acid generator component (B). [Selection figure] None |