| abstract |
Provided is a radiation-sensitive resin composition that sufficiently satisfies not only basic characteristics such as sensitivity and resolution but also MEEF performance. [A] A radiation-sensitive material containing a polymer having a structural unit whose solubility in an alkaline developer is increased by the action of an acid generator represented by the following formula (1) and [B] (b1) acid. Resin composition. (In Formula (1), R 1 is a monovalent organic group. Y is a divalent organic group having 1 to 15 carbon atoms, provided that hydrogen contained in the divalent organic group having 1 to 15 carbon atoms. Some or all of the atoms may be substituted. A + is an organic cation.) [Selection figure] None |