| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_a30ab3a389fcab88bddd13c33c4e763b
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_24aca9ded2638ea793d05360dde7a4a0
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_c5f2eb493231fe428d656256e8ac20c4
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_e726f44d81f927d0c1cdb6540437181d |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S430-126
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S430-111
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-2041 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-30
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-38
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-2041
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0397
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0392
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0382
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0046
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0045
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-004
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-00 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-38
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-30
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 |
| filingDate |
2011-08-30-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate |
2013-11-05-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_bd21abb73527358c628c404aa1763a0b
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_346617a134a1441531bfb39be38ecc71
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_d0388ef99d4c795606a28c53fbaefad8 |
| publicationDate |
2013-11-05-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
US-8574811-B2 |
| titleOfInvention |
Resist composition and method for producing resist pattern |
| abstract |
A resist composition contains; a resin having a structural unit derived from a compound represented by the formula (a); and an acid generator. n n n n n n n n n n n n wherein R 1 represents a hydrogen atom or a methyl group; R 2 represents an optionally substituted C 1 to C 18 aliphatic hydrocarbon group; A 1 represents an optionally substituted C 1 to C 6 alkanediyl group or a group represented by the formula (a-g1); n n n n n n n n n n n n n n n n wherein s represents 0 or 1; A 10 and A 12 independently represent an optionally substituted C 1 to C 5 aliphatic hydrocarbon group; A 11 represents a single bond or an optionally substituted C 1 to C 5 aliphatic hydrocarbon group; X 10 and X 11 independently represents an oxygen atom, a carbonyl group, a carbonyloxy group or an oxycarbonyl group; provided that a total number of the carbon atom of A 10 , A 11 , A 12 , X 10 and X 11 is 6 or less. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2014093827-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9740105-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2012219904-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8940473-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2014147787-A1 |
| priorityDate |
2010-08-30-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |