| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_24aca9ded2638ea793d05360dde7a4a0
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_a30ab3a389fcab88bddd13c33c4e763b
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_f835588cdee9e8c7165088076c171c79
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_e726f44d81f927d0c1cdb6540437181d |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S430-126
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S430-122
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S430-115
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S430-124 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-2041
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-26
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0045
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0046
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0397
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0392
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-11
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-038 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-20
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-027 |
| filingDate |
2012-02-24-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_e49a931f4c643b2472a55d1db9e30355
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_fbb0205b981e00a2dd5aa66b530a2119
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_c4c61d8c8cfa1054bfaa528c41d9c8c9 |
| publicationDate |
2012-08-30-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
US-2012219904-A1 |
| titleOfInvention |
Resist composition and method for producing resist pattern |
| abstract |
A resist composition contains (A1) a resin having a structural unit represented by the formula (I), (A2) a resin being insoluble or poorly soluble in alkali aqueous solution, but becoming soluble in an alkali aqueous solution by the action of an acid, and (B) an acid generator represented by the formula (II). n n n n n n n n n n n n wherein R 1 represents a hydrogen atom or a methyl group; A 1 represents a C 1 to C 6 alkanediyl group; R 2 represents a C 1 to C 10 hydrocarbon group having a fluorine atom; R 3 and R 4 independently represent a fluorine atom or a C 1 to C 6 perfluoroalkyl group; X 1 represents an C 1 to C 17 divalent saturated hydrocarbon group; R 5 represents a group having cyclic ether structure; and Z 1+ represents an organic cation. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8753796-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9223205-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2012258401-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9360754-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9507258-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2013236832-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2012264055-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9791776-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8685619-B2 |
| priorityDate |
2011-02-25-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |