| abstract |
A resist composition contains (A1) a resin having a structural unit represented by the formula (I), (A2) a resin being insoluble or poorly soluble in alkali aqueous solution, but becoming soluble in an alkali aqueous solution by the action of an acid, (B) an acid generator, and (D) a compound represented by the formula (II), n n n n n n n n n n n n wherein R 1 represents a hydrogen atom or a methyl group; A 1 represents a C 1 to C 6 alkanediyl group; R 2 represents a C 1 to C 10 hydrocarbon group having a fluorine atom; ring W 1 represents a C 2 to C 36 substituted heterocyclic ring; R 3 represents a C 1 to C 30 hydrocarbon group, and one or more —CH 2 — contained in the hydrocarbon group may be replaced by —O— or —CO—. |