| abstract |
(57) [Summary]nPROBLEM TO BE SOLVED: To provide an efficient and high-precision pattern at room temperature Provision of nano-imprint-lithography.nThe siloxane component of the general formula An[R n Si (OH) 4-n General formula An(Where R is H or an alkyl group, n is an integer of 0 to 3) And alcohols, esters, ketones or A solution containing a mixture of two or more of these as a main component After coating on the material surface, a fine pattern By embossing, removal of solvent and hydrolysis curing, Alternatively, using a hydrogenated silsesquioxane polymer, After forming a coating film by remmer on the surface of the material to be processed, After embossing the surface at 150 ° C or less, More fine SiO 2 Two Form a pattern Way. |