| abstract |
PROBLEM TO BE SOLVED: To apply a liquid material excellent in releasability from a mold material to an imprinting lithography method to obtain a fine pattern and to obtain polarized light separation using the fine pattern forming method A method for producing an element is provided. A liquid material containing a saddle type polysilsesquioxane represented by the following general formula (1) is applied to a surface of a work material to form a liquid material film; A step of temporarily curing the liquid material film to form a temporary cured film, a step of transferring the pattern of the mold material to the temporary cured film by a mold material on which a fine pattern is formed, and a step of completely curing the surface of the work material And a fine pattern forming method. [Chemical 1] [Selection figure] None |