| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_d31d1f923546d09046d63822169e9a37
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_3e9c9ce39bd10cdfec0057afe48e6710
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_d5d04736b0b882a4f5a1e0e0e4cd8cbb
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_37dbda4ffd1ea777b6a4ee085839a442
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_14af4ee2d812946e659a2c5c20f5f050 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B82Y40-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B82Y10-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08G59-42
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0757
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08G59-3281
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08G59-306
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07F7-21
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07F7-0838
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0002 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08G59-20
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07F7-21
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 |
| filingDate |
2008-11-05-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_30d0a96120a4f0914d3e5e3fbfdd96a1
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_088c1011ba4b11909f7893dd48129a11
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_b91435f861f6d83641b66688965f7690
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_18e9f902f20b2cef054fd4ce80fe3ce7 |
| publicationDate |
2009-05-14-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
WO-2009060862-A1 |
| titleOfInvention |
Epoxy group-containing organosiloxane compound, curable composition for transfer material, and fine pattern forming method using the composition |
| abstract |
Disclosed is a curable composition for transfer materials, which is applicable to a UV nanoimprint process which enables formation of a fine pattern with high throughput, and is sometimes applicable even to a thermal nanoimprint process. This curable composition for transfer materials enables formation of a fine pattern having high selectivity between etching rates of a fluorine gas and an oxygen gas. Specifically disclosed is a curable composition for transfer materials characterized by containing a curable silicon compound which is produced by a hydrosilylation reaction between a silicon compound (A) having an Si-H group and a compound (B) having a curable functional group and a carbon-carbon double bond other than the curable functional group. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-5855001-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2011018722-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2011063568-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2011020360-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2012049301-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2011236207-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2013080741-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-102188989-B1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2013051410-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2012020730-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2013251560-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8957136-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-WO2015056723-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-103154090-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2015056723-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20160072095-A |
| priorityDate |
2007-11-07-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |