| abstract |
Disclosed is a curable composition for a transfer material that is well suited to nanoimprinting, whereby ultrafine patterns to be used for a resist, etc., can be formed, and which has high dry etching resistance to argon gas, and high selectivity of dry etching speeds with argon gas and oxygen gas. The curable composition for a transfer material is characterized by containing a (meth) acrylate compound that possesses triazine skeleton obtained by causing a reaction between an aminotriazine compound, a compound that possesses a hydrocarbon group and a (meth) acryloyl group in the molecule thereof, and an aldehyde. |