| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_2baf849d216e689ecc40ccc931a7a7bc
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_1b7315807a17278234872e7a758af632
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_3beac8c787f7a8b0bac87bafad28a966
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_9ffff99a89f44d2ead9fbacb70d59b53 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-0276
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-091 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-09
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-11
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 |
| filingDate |
2004-10-29-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_9583406bac9855fb76d048dfd69e444c
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_2fdc227352fbf15afc244d05d1355c5b
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_b706d23a355c25295ae7d00343c00907 |
| publicationDate |
2005-05-12-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
WO-2005043248-A1 |
| titleOfInvention |
Composition for forming underlying film containing dextrin ester compound |
| abstract |
[PROBLEMS] Disclosed is a composition for forming an underlying film for lithography which is used in a lithography process in semiconductor device production. Also disclosed is an underlying film for lithography which has a higher dry etching rate than a photoresist and does not cause intermixing with the photoresist. [MEANS FOR SOLVING PROBLEMS] The composition for forming an underlying film for lithography contains a dextrin ester compound wherein at least 50% of hydroxyl groups are transformed to ester groups, a crosslinkable compound and an organic solvent. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-4697467-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20200118157-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2007256773-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2019012716-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20200030528-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-WO2006049046-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-4706851-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2007017950-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2006049046-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-7687223-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2005331951-A |
| priorityDate |
2003-10-30-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |