| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_527d41cad118be2c39e19a33eab54468 |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F220-28 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F20-28
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F212-32
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F220-62
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08B37-0057
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0047
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08L5-14
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08L33-08
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08L33-14
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-091
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-11
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-039
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08L1-02
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F220-28 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F220-28
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08L33-14
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F212-32
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F20-28
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-11
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039 |
| filingDate |
2019-02-25-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_3b3963badabbaf9ee529bbd7354ad27d
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_f2f0cd4af41b5028c33af2a4d42079c4 |
| publicationDate |
2020-10-14-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
KR-20200118157-A |
| titleOfInvention |
Underlayer film forming composition, pattern forming method, copolymer and underlayer film forming composition monomer |
| abstract |
An object of the present invention is to provide a composition for forming an underlayer film capable of forming an underlayer film having a low UV reflectance and excellent etching resistance as an underlayer film having a high residual ratio to an organic solvent. The present invention contains a copolymer and an organic solvent, and is a composition for forming an underlayer film used for pattern formation, wherein the copolymer is derived from (a) a unit derived from a sugar derivative, and (b) a compound having a function of preventing light reflection. And (c) a unit derived from a compound capable of cross-coupling a copolymer, and (a) a unit derived from a sugar derivative is a unit derived from a pentose derivative and a unit derived from a hexose derivative It is at least one type selected from, and the composition for forming an underlayer film relates to a composition for forming an underlayer film for introducing a metal. |
| priorityDate |
2018-02-26-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |