| abstract |
PROBLEM TO BE SOLVED: To provide a novel light-absorbing composition which can be used as an anti-reflection coating composition including deep UV applications, especially useful when a flattening coating layer is required. . A method of forming a photoresist relief image on a substrate having a topography, comprising: (A) applying a layer of an antireflective composition comprising a polymer having a molecular weight of about 8,000 or less to a substrate; (b) applying a layer of a photoresist composition over the antireflective composition layer; And (c) exposing the photoresist layer with activating radiation and developing the exposed photoresist layer, the method comprising forming a photoresist relief image. |