| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_268be9afa00cf55b5aa72b1612151ecb
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_1253596246bdf9e3867a525279fc8f77
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_00e3090fca49f8c2d2545b56fcef3917
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_be63d6a4ae2826268c4b86c25fb333cc
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_313d9f1474ced0f5b728bb61e84dede3
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_2d45d4cb607fe909e3fa4bfd85a63b59 |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S430-111
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S430-106 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-004
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-327
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-325
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-2041
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0045
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0397
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0382
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-30
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0395
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F220-10 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-038
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-20
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-32
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-30 |
| filingDate |
2010-10-05-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate |
2015-04-07-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_66a458f35fa9f753eb050db5c20b1c7a
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_598864c6c7199fe360dfca5156e576d8
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_6a082bdc2a76faf1b91ea0374fec564d
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_105ef3657da5ecffa8f1fa0c814b1a06
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_0099a853c9c0c62268cd002e0b5a3fac |
| publicationDate |
2015-04-07-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
US-8999621-B2 |
| titleOfInvention |
Pattern forming method, chemical amplification resist composition and resist film |
| abstract |
A pattern forming method includes: (i) forming a film from a chemical amplification resist composition; (ii) exposing the film, so as to form an exposed film; and (iii) developing the exposed film by using an organic solvent-containing developer, wherein the chemical amplification resist composition contains: (A) a resin substantially insoluble in alkali; (B) a compound capable of generating an acid upon irradiation with an actinic ray or radiation; (C) a crosslinking agent; and (D) a solvent, a negative chemical amplification resist composition used in the method, and a resist film formed from the negative chemical amplification resist composition. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11327398-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11599021-B2 |
| priorityDate |
2009-10-06-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |