| abstract |
A resist developer obtained by a process comprising mixing (1) at least one compound selected from the group consisting of a basic compound A and an organic compound B having phenolic hydroxyl group and carboxyl group in a molecule, and/or (2) a salt C formed between the basic compound A and the organic compound B. The resist developer exhibiting excellent dissolution selectivity, and developing a resist in a short period of time, can be used for developing positive and negative resists. |