| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_1434599d8125f53b4d9da4b7c33bfa8b
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_b27b8c5a299b6ceb83eb81ffdf567636
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_e5db580deca7130dbe51805c6c608b35 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-76816
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-40
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-168
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-0273 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-312
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L29-02
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-26 |
| filingDate |
2012-01-30-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_4edf744695cafdfd7a3ec245703bc221
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_a16f2774dd75cb43401cf2262217d948 |
| publicationDate |
2012-05-24-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
US-2012126372-A1 |
| titleOfInvention |
Resist pattern thickening material and process for forming resist pattern, and semiconductor device and method for manufacturing the same |
| abstract |
A resist pattern thickening material is disclosed that can utilize ArF excimer laser light; which, when applied over a resist pattern such as an ArF resist having a line pattern or the like, can thicken the resist pattern regardless of the size of the resist pattern; which has excellent etching resistance; and which is suited for forming a fine space pattern or the like, exceeding the exposure limits. Also disclosed is a process for forming a resist pattern and a method for manufacturing a semiconductor device, wherein the resist pattern thickening material of the present invention is suitably utilized. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2019121232-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2011092071-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10534260-B2 |
| priorityDate |
2005-11-30-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |