| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_268be9afa00cf55b5aa72b1612151ecb
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_99e8f6462d5068f0c52f041765343d58
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_162bb611933a450eb3afc08c85227e17 |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0045
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F220-283
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F220-24 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F220-1811
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F220-1812
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-038
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F230-085 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-038
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 |
| filingDate |
2008-09-22-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_16a879c32edf919f7bd738468d47aaf8 |
| publicationDate |
2009-04-02-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
WO-2009041400-A1 |
| titleOfInvention |
Negative resist composition and resist pattern-forming method using the same |
| abstract |
Disclosed is a negative resist composition which enables to improve performance of microphotofabrication using far ultraviolet light, particularly an ArF excimer laser having a wavelength of 193 nm. Specifically disclosed is a negative resist composition which hardly suffers from pattern collapses during fine pattern formation, while exhibiting good resolution. The negative resist composition is characterized by containing an alkali-soluble resin (A), a compound (B) including a low-molecular-weight compound having an oxethane structure having a molecular weight of not more than 2000, and a cationic photopolymerization initiator (C). Also specifically disclosed is a resist pattern-forming method using such a negative resist composition. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2011053248-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2011043481-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2011100089-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8999621-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2011059531-A |
| priorityDate |
2007-09-26-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |