abstract |
PROBLEM TO BE SOLVED: To provide a photosensitive composition for forming a pattern of a micro phase separation structure having high heat resistance. SOLUTION: (A) a block copolymer containing a segment having an alkoxysilyl group-containing monomer as a repeating unit, and (B) a photosensitive decomposing agent, and the molecular weight distribution index (Mw / A photosensitive composition having a Mn) of 1.8 or less is provided. [Selection figure] None |