| abstract |
A positive resist composition is provided which comprises a resin having 2-alkyl-2-adamantyl (meth)acrylate polymerization unit represented by the following formula (I):wherein R1 represents hydrogen or methyl and R2 represents an alkyl, and being insoluble or barely soluble in alkali, but being converted to soluble in alkali by the action of an acid;and an acid generator represented by the following formula (V):wherein Q1, Q2 and Q3 independently represent hydrogen, a hydroxyl group, an alkyl having 1 to 6 carbon atoms or an alkoxy having 1 to 6 carbon atoms, and n is an integer of 4 to 8. The composition exhibits good resolution upon exposure by a ArP excimer laser and has little substrate dependency. |