| abstract |
The present invention provides a chemically amplified resist composition comprising: (A) a salt represented by (I): n n n n n n n n n n wherein R 21 represents a C1-C30 hydrocarbon group, Q 1 and Q 2 each represent a fluorine atom, and A + represents at least one organic cation represented by (Ia): n n n n n n n n n n wherein P 1 -P 3 each represent C1-C30 alkyl group,n na cation represented by (Ib):n n n n n n n n n n n wherein P 4 and P 5 each represent a hydrogen atom, and a cation represented by (Ic): n n n n n n n n n n wherein P 10 -P 21 each represent hydrogen atom, B represents sulfur or oxygen atom and m represents 0 or 1;n n(B) a salt (II):n n n n n n n n n n n wherein R 22 represents C1-C30 hydrocarbon group, Q 3 and Q 4 each represent fluorine atom, and A′ + represents an organic cation (IIa): n n n n n n n n n n wherein P 6 and P 7 are each a C1-C12 alkyl group, P 8 represents hydrogen atom, P 9 represents C1-C12 alkyl group; andn n(C) a resin which contains a structural unit having an acid-labile group. |