| abstract |
(57) [Summary] [Problem] Resist performance such as sensitivity and resolution is good. Provided is a chemically amplified positive resist composition having excellent adhesion to a substrate, and a copolymer serving as a resin component thereof. SOLUTION: The present invention provides a copolymer having a structural unit represented by the following formulas (I) and (II) and optionally further represented by the following formula (III), and further comprising a copolymer as a resin component and further containing an acid generator. A positive resist composition is provided. Wherein R 1 and R 2 represent hydrogen, alkyl optionally having a hydroxyl group, a hydroxyl group or a group —COOCH (CH 3 ) OC 2 H 4 —R 3 , or R 1 and R 2 represent or to form a carboxylic acid anhydride residue, or a group -COOCH (CH 3) OC 2 H 4 -R 3 form a divalent hydrocarbon residue which may have, where R 3 is hydrogen, Represents an alkyl or alicyclic carbonyloxy, and R 5 Is hydrogen or methyl, R 6 is an alicyclic group, X is a direct bond, Alkylene or cyclohexylene having 1 to 4 carbon atoms, m And n represents 0 or 1. |