abstract |
A chemical amplifying type positive resist composition,nexcellent in adhesion to a substrate and good in resistnperformances and suitable for exposure using a KrF excimernlaser, ArF excimer laser, or the like, which comprises a resinnhaving a polymerization unit of 2-alkyl-2-adamantyln(meth)acrylate and a polymerization unit of a monomer selectednfrom 3-hydroxy-1-adamantyl (meth)acrylate andn(meth)acrylonitrile, and an acid generator is provided. |