http://rdf.ncbi.nlm.nih.gov/pubchem/patent/EP-1452918-A1
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_89afae566b725ae78e20cf972d9bcdc7 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-039 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0397 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F220-18 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F220-28 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 |
| filingDate | 2002-11-29-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_de9c993ed66f82baae6aa97500ecf35e http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_75c5e7896cd81053eae8dc081ae85e2d http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_6905dfe8fddb653e9dc31517dbe6027b http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_efa468b361066689cdf41ee3391659d7 |
| publicationDate | 2004-09-01-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | EP-1452918-A1 |
| titleOfInvention | Positive resist composition and method of forming resist pattern |
| abstract | There is provided a positive type resist composition comprising (A) a resinncomponent with only units derived from an acrylate ester in the principal chain, for whichnthe solubility in alkali increases under the action of acid, (B) an acid generator componentnwhich generates acid on exposure, and (C) an organic solvent component, wherein thenresin component (A) is a copolymer comprising (a1) a structural unit derived from annacrylate ester comprising, as an acid dissociable dissolution inhibiting group on a sidenchain, a polycyclic dissolution inhibiting group which is eliminated more easily than a 2-methyl-2-adamantylngroup, (a2) a structural unit derived from an acrylate ester comprisingna lactone containing polycyclic group on a side chain, and (a3) a structural unit derivednfrom an acrylate ester comprising a hydroxyl group containing polycyclic group on a sidenchain; as well as a resist pattern formation method using such a composition. |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/DE-112004001155-B4 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-7763412-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/EP-1655315-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/EP-1655315-A4 |
| priorityDate | 2001-12-03-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 196.