| abstract |
A chemical amplifying type positive resist composition havingnhigh transmittance, superior in sensitivity and resolution inna lithography utilizing a light having a wavelength of 220 nmnor lower and confering a good profile is provided,nWhich comprisesn an aliphatic sulfonium salt represented by the following formulan(I):n nwherein either Q 1 , Q 2 , Q 3 and Q 4 represent an alkyl group or ancycloalkyl group, or Q 1 and Q 2 and/or Q 3 and Q 4 form, togethernwith the adjacent sulfur atom, a heterocyclic group, and mnrepresents an integer of 1 to 8; at least one onium salt selected from the group consisting ofna triphenylsulfonium salt and a diphenyliodonium salt; and a resin which contains a polymerization unit having a groupnunstable to an acid, and which is insoluble in alkali by itselfnbut becomes soluble in alkali by the action of an acid. |