| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_e415f6f1eeb8706d299ea086326248bf |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0382
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0395
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0392 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-004
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0045
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0397
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07D333-46
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07D333-48
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07D335-02 |
| classificationIPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-038 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07D333-48
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07D333-46
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07D335-02
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F212-14
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039 |
| filingDate |
2002-10-04-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_cb1fa9198a093633d503626edbf93980
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_2ce51c74bac8acbf1befc9d435ca3676
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_690da21a09869aa9355110dcde25c2bb |
| publicationDate |
2003-09-03-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
EP-1308781-A3 |
| titleOfInvention |
Cyclic sulfonium and sulfoxonium photoacid generators and photoresists containing them |
| abstract |
New photoacid generator compounds ("PAGs") are provided and photoresistncompositions that comprise such compounds. In particular, cyclic sulfonium and sulfoxoniumnPAGs are provided. PAGs of the invention are particularly useful as photoactive components ofnphotoresists imaged at short wavelengths such as 248 nm, 193 nm and 157 run. |
| priorityDate |
2001-10-05-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |