Predicate |
Object |
assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_bce787970b69aeb08d159e7c101c9ed7 |
classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G01N2201-0833 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G01N2201-08 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L22-26 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32082 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J2237-3341 |
classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G01N21-73 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G01J3-443 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32972 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-3411 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G01J3-0218 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L22-26 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32082 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-67069 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32568 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32743 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-67253 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-3065 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-31116 |
classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-67 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-66 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-26 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01J37-32 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G01N21-73 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-311 |
filingDate |
2017-04-11-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
grantDate |
2019-06-11-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_dd97ca957ec62a8f68b493c9c1eff69d http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_2a71d9731ebb40ed94d24f1e51fd6a17 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_d036872a377c66ed8e304f704e3db888 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_3d234124be7e513dda348c4f8808368e http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_5279bc0ae1450de664f316da3f097499 |
publicationDate |
2019-06-11-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber |
US-10319649-B2 |
titleOfInvention |
Optical emission spectroscopy (OES) for remote plasma monitoring |
abstract |
Methods and systems for etching substrates using a remote plasma are described. Remotely excited etchants are formed in a remote plasma and flowed through a showerhead into a substrate processing region to etch the substrate. Optical emission spectra are acquired from the substrate processing region just above the substrate. The optical emission spectra may be used to determine an endpoint of the etch, determine the etch rate or otherwise characterize the etch process. A weak plasma may be present in the substrate processing region. The weak plasma may have much lower intensity than the remote plasma. In cases where no bias plasma is used above the substrate in an etch process, a weak plasma may be ignited near a viewport disposed near the side of the substrate processing region to characterize the etchants. |
isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11735401-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2023089089-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11114286-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11499869-B2 |
priorityDate |
2017-04-11-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type |
http://data.epo.org/linked-data/def/patent/Publication |