abstract |
A resist pattern forming method capable of forming a fine resist pattern with good lithography characteristics by a negative developing process using a developer containing an organic solvent, and a negative developing resist composition used in the method I will provide a. On a support using a resist composition comprising a base component (A) whose solubility in an organic solvent is reduced by the action of an acid and an acid generator component (B) that generates an acid upon exposure. A step of forming a resist film, a step of exposing the resist film, and a step of patterning the resist film by negative development using a developer containing the organic solvent to form a resist pattern. A resin component having a structural unit (a0) derived from an acrylate ester containing an acid-decomposable group that generates an alcoholic hydroxyl group by the action of an acid and increases hydrophilicity, as the pattern forming method (A) (A1) is used. [Selection figure] None |