| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_89afae566b725ae78e20cf972d9bcdc7 |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F220-283
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07C2603-74
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S430-106
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S430-111 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F220-283
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F220-282
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0046
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0397
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F220-281 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-033
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 |
| filingDate |
2004-10-07-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_29407907a39a844a28ecb90f4f3aa9f9 |
| publicationDate |
2006-04-20-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
JP-2006106497-A |
| titleOfInvention |
Resist composition and resist pattern forming method |
| abstract |
PROBLEM TO BE SOLVED: To provide a resist composition capable of reducing LWR and a method for forming a resist pattern. In a positive resist composition containing a resin component (A) and an acid generator component (B), the component (A) comprises (a0) a structural unit represented by the following general formula (a0): [Chemical 1] (R represents a hydrogen atom or a lower alkyl group; Y 1 represents an aliphatic cyclic group; Z represents an alkoxyalkyl group; a represents an integer of 1 to 3, b represents an integer of 0 or 1 to 2, and a + b = 1 ~ 3.) (A1) A polymer unit (A1) that is a structural unit derived from an (α-lower alkyl) acrylate ester having an acid dissociable, dissolution inhibiting group and has a unit that does not correspond to the structural unit (a0). Resist composition. [Selection figure] None |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2011236826-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-101027361-B1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-101034164-B1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2012073565-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8632960-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-100998464-B1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-100998463-B1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8530598-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2008203639-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8247159-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8440386-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2007138797-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-101475554-B1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2007077261-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-7964331-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-7968276-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2007316294-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8211615-B2 |
| priorityDate |
2004-10-07-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |