http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-101034164-B1
Outgoing Links
| Predicate | Object |
|---|---|
| classificationCPCAdditional | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S430-111 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-039 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0397 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0045 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039 |
| filingDate | 2007-05-18-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 2011-05-12-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate | 2011-05-12-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | KR-101034164-B1 |
| titleOfInvention | Positive resist composition and method of forming resist pattern |
| abstract | As a positive resist composition containing the resin component (A) which alkali solubility increases by the action of an acid, and the acid generator component (B) which generate | occur | produces an acid by exposure, the said resin component (A) is the following general Polymer (A1) which has a structural unit (a0) represented by Formula (a0), and does not have structural unit (a1) other than the said structural unit (a0) derived from the acrylate ester containing an acetal type acid dissociable, dissolution inhibiting group. And the polymer (A2) which has the said structural unit (a1) and does not have the said structural unit (a0), The positive type resist composition characterized by the above-mentioned.n n n [Formula 1] |
| priorityDate | 2006-06-22-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 222.