| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_03d0f52bb4069f8a19d70dcfb697c67a |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S430-111 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0397
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-039
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-027 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F20-20
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 |
| filingDate |
2003-02-21-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_abf92c6162f276a54a5782dd87f205c1 |
| publicationDate |
2004-01-07-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
KR-20040002435-A |
| titleOfInvention |
Positive resist composition |
| abstract |
(A) Resin which the dissolution rate with respect to alkaline developing solution increases by the action of an acid containing the repeating unit represented by following General formula (I); And (B) a compound which generates an acid by irradiation with actinic light or radiation.n n n n n n n n In the formula, R 1 represents a hydrogen atom or an alkyl group, A 1 represents a single bond or a linking group, R 2 represents an alkylene group, and X represents an alkoxy group or a hydroxyl group. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-101042485-B1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-7964331-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-101034164-B1 |
| priorityDate |
2002-02-21-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |