http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2015212830-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_268be9afa00cf55b5aa72b1612151ecb |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-20 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F220-10 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-038 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-32 |
| filingDate | 2015-06-22-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_57d69c998ba644a25a483999a8d015ba http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_075a3a80b789dfad4c9a83d380354072 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_001acd2b0a91f42454c036017469437c http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_c60ceb97ffa8c2ffcb34d3c17b95dc3f |
| publicationDate | 2015-11-26-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-2015212830-A |
| titleOfInvention | Actinic ray-sensitive or radiation-sensitive resin composition, pattern forming method, resist film, and electronic device manufacturing method |
| abstract | A pattern forming method that is excellent in roughness performance such as line width roughness, uniformity of local pattern dimensions, and exposure latitude, has little development time dependency of pattern size, and can suppress film slippage due to development, and Provision of an actinic ray-sensitive or radiation-sensitive resin composition to be used. (A) a resin (P) having 20% by mole or more of a repeating unit (a1) represented by the following general formula (I) or (II) with respect to all repeating units in the resin (P); An actinic ray-sensitive or radiation-sensitive resin composition containing the compound (B) that generates an acid upon irradiation with an actinic ray or radiation. (In formulas (I) and (II), Ra 1 represents an (n + 1) -valent alicyclic hydrocarbon group, and Ra 2 represents a (p × 2 + 1) -valent alicyclic hydrocarbon group.) [Selection figure] None |
| priorityDate | 2011-07-28-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 359.