| abstract |
PROBLEM TO BE SOLVED: To provide an actinic ray-sensitive or radiation-sensitive resin composition capable of forming a good pattern with any of PEBS, MEEF, coverage dependency and bridge defect, and a pattern forming method using the same. . SOLUTION: (A) a resin whose solubility in an alkaline developer is increased by the action of an acid, (B) a compound that generates an acid upon irradiation with actinic rays or radiation, and (C) a decomposition that is caused by the action of an alkali developer. And a resin containing at least one of a fluorine atom and a silicon atom, which contains a repeating unit having a polar conversion group that increases the solubility in an alkali developer, and is an actinic ray as the compound (B) Alternatively, an actinic ray-sensitive or radiation-sensitive resin composition containing a compound that generates an acid represented by the following general formula (I) upon irradiation with radiation. (Each symbol in the general formula (I) has the meaning described in the specification.) [Chemical 1] [Selection figure] None |