Predicate |
Object |
assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_24aca9ded2638ea793d05360dde7a4a0 |
classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0046 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0045 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-029 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-092 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0397 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0392 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-2041 |
classificationIPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07C381-12 |
classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09K3-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07D303-16 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07D303-02 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07D305-06 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039 |
filingDate |
2012-03-27-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_2f245ddfecb97f7771c44d356e4580e0 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_670712e4c98df4c464bc1ac57747e207 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_a144f3526dc1d67cb5c2c69f8714bf36 |
publicationDate |
2012-11-15-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber |
JP-2012226327-A |
titleOfInvention |
Resist composition and method for producing resist pattern |
abstract |
An object of the present invention is to provide a resist composition capable of producing a resist pattern with little pattern collapse. (A) A resin that is insoluble or hardly soluble in an alkaline aqueous solution and can be dissolved in an alkaline aqueous solution by the action of an acid; (B) an acid generator represented by formula (II); and (D) a formula (I) The resist composition containing the compound represented by this. [Wherein R 1 and R 2 are independently a hydrocarbon group, an alkoxy group, etc .; m and n are independently an integer of 0 to 4; R 3 and R 4 are independently a fluorine atom or a perfluoroalkyl group; X 1 represents a divalent saturated hydrocarbon group; R 5 represents a group containing a cyclic ether structure; Z1 + represents an organic cation. ] [Selection figure] None |
isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2015068860-A |
priorityDate |
2011-04-07-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type |
http://data.epo.org/linked-data/def/patent/Publication |