Predicate |
Object |
assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_268be9afa00cf55b5aa72b1612151ecb |
classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-2006 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-322 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-168 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-162 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-38 |
classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-004 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0045 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09D133-04 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F212-32 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F22-18 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08K5-36 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F220-68 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08L33-04 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F212-24 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-322 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-325 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09D125-18 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-038 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-039 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0392 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0397 |
classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F22-02 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F22-10 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-20 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F12-12 |
filingDate |
2018-05-11-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_8f9ff6052e5844739d06b9266c7bc5bb http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_0d5467ec1beef10b98299b819da7d4f9 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_41a49957bf2e72fa1d22ee1d541feddb http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_418adfc5c521106563c7c05c50a58134 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_a82f0f11ca881cdaef29c3848498e9b5 |
publicationDate |
2018-11-22-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber |
WO-2018212079-A1 |
titleOfInvention |
Active ray-sensitive or radiation-sensitive resin composition, resist film, pattern formation method, and electronic device production method |
abstract |
Provided are: an active ray-sensitive or radiation-sensitive resin composition with which it is possible to form a pattern that is applicable as a mask having excellent crack resistance and etching resistance; a resist film; a pattern formation method; and an electronic device production method. This active ray-sensitive or radiation-sensitive resin composition contains a resin and has a solid concentration of 10 mass% or more, wherein: the resin comprises a repeat unit A derived from a monomer having a homopolymer glass transition temperature of 50°C or lower and a repeat unit B having an acid-decomposable group; the contained amount of the repeat unit B is 20 mol% or less with respect to the total amount of the repeat units in the resin; and at least one type of the repeat units in the resin has an aromatic ring. |
isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-102481142-B1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20210053154-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-7076207-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-7080049-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2020187352-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2019120765-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2019120766-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2019131447-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2019131434-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11550220-B2 |
priorityDate |
2017-05-19-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type |
http://data.epo.org/linked-data/def/patent/Publication |