| Predicate |
Object |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-16
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-20
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-30 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-2004
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-2022
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0382
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-038
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-325
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-004
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-30 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-038 |
| filingDate |
2020-06-15-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate |
2022-12-23-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate |
2022-12-23-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
KR-102481142-B1 |
| titleOfInvention |
Negative tone photoresist for euv lithography |
| abstract |
A negative tone photoresist and a method for developing the negative tone photoresist are disclosed. For example, a negative tone photoresist includes a solvent, a dissolution inhibitor, and a polymer. The polymer contains hydroxy groups. The polymer may be greater than 40% by weight of the total weight of the negative tone photoresist. |
| priorityDate |
2019-10-30-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |