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publicationDate 2023-01-10-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber US-11550220-B2
titleOfInvention Negative tone photoresist for EUV lithography
abstract A negative tone photoresist and method for developing the negative tone photoresist is disclosed. For example, the negative tone photoresist includes a solvent, a dissolution inhibitor, and a polymer. The polymer includes a hydroxyl group. The polymer may be greater than 40 weight per cent of a total weight of the negative tone photoresist.
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