| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_1eb9cd2af2f87dcf20b0fbbdfe79996e |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02348
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02203 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-67115
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-6719
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02041
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-67017
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02348
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02203
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-67207 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-02
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-67
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-00 |
| filingDate |
2014-04-24-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate |
2016-07-05-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_991cd9fd11d6f755b6b59013924a9a85
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_570e1f719c51a06bab4fe8a39e5b5971
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_21fb6c6b7d348e2ed9d5cb93dcc00468
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_1ae9175697a6b521acb2118cfe3d0a3a |
| publicationDate |
2016-07-05-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
US-9384959-B2 |
| titleOfInvention |
Purging of porogen from UV cure chamber |
| abstract |
A purge ring for providing a gas to a wafer processing chamber includes an inlet ring wall defining a ring hole space. An outer perimeter of the inlet ring wall is elliptical. An outer perimeter of the ring hole space is circular. The inlet ring wall is a continuous structure surrounding the ring hole space. An inlet baffle formed within the inlet ring wall surrounds at least 180 degrees of the outer perimeter of the ring hole space. An inlet plenum arranged in a first end of the inlet ring wall provides the gas to the ring hole space through the inlet baffle. An exhaust channel is formed within the inlet ring wall in a second end of the inlet ring wall. An exhaust outlet hole arranged in the second end of the inlet ring wall exhausts the gas out of the ring hole space via the exhaust channel. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11177131-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11270896-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2015255285-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9963782-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10121682-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10020197-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10388546-B2 |
| priorityDate |
2005-04-26-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |