| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_1eb9cd2af2f87dcf20b0fbbdfe79996e
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_8a3f57c88cc904c824e6be26c43ca3a6
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_cb5841eb9df3e22280e17a33cd27162d
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_250abbd899126e5c98df3862b72f92bb
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_5ae00bf6fd548d93f305269632ff5d5e |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-6719
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-67115
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-67207
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02203
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02348
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-67017
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02041 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23F1-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-306 |
| filingDate |
2012-07-31-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate |
2013-08-27-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_1e28ae7c45f27feb1c36ae908049ed17
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_27b0e2a687064c673e8576046655b02f
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_dc26c874fcd405937d7b174cf6d14767
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_d40495605cc0733e899a00191c658600 |
| publicationDate |
2013-08-27-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
US-8518210-B2 |
| titleOfInvention |
Purging of porogen from UV cure chamber |
| abstract |
An apparatus for purging a space in a processing chamber comprises a source of a purge gas; an inlet portion of a purge ring; an inlet baffle located in the inlet portion and fluidically connected to the source of purge gas; and an exhaust portion of the purge ring. The inlet portion and the exhaust portion define a ring hole space having a 360° periphery. The inlet baffle preferably surrounds not less than 180° of said periphery. The inlet baffle is operable to convey purge gas into the ring hole space. The exhaust portion is operable to convey purge gas and other matter out of the ring hole space. Cleaning of the purge ring and other structures in a processing chamber is conducted by flowing a cleaning gas through the inlet baffle. Some embodiments include a gas inlet plenum and an exhaust channel but not a purge ring. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9028765-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2013284087-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9384959-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8734663-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9073100-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9963782-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8986495-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11177131-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2011132542-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10519546-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10020197-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10121682-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2014116336-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10388546-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11270896-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2015255285-A1 |
| priorityDate |
2005-04-26-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |