| abstract |
A resist composition of the invention includes: (A) a resin being insoluble or poorly soluble in alkali aqueous solution, but becoming soluble in an alkali aqueous solution by the action of an acid, (B) an acid generator represented by the formula (II), and (D) a compound represented by the formula (I), n n n n n n n n n n n n wherein R 1 , R 2 , m, n, Q 1 , Q 2 , L 1 , ring W 1 and Z + are defined in the specification. |