| abstract |
Disclosed is [A] a radiation-sensitive resin composition comprising an acid generator that generates an organic acid by means of irradiation with radioactive rays, wherein the radiation-sensitive resin composition is characterized in that the organic acid has a cyclic hydrocarbon group and an organic group comprising a bond that produces a polar group by being cleaved by an acid or a base. The abovementioned organic acid is preferably an organic acid represented by formula (I). In formula (I), Z is an organic acid group. R 1 is an alkanediyl group. However, a portion or all of the hydrogen atoms in the abovementioned alkanediyl group may be substituted with fluorine atoms. X is a single bond, O, OCO, COO, CO, SO 3 , or SO 2 . R 2 is a cyclic hydrocarbon group. R 3 is a monovalent organic group having a functional group represented by formula (x). n is an integer in the range of 1 to 3. However, in cases in which there is a plurality of R 3 's, the plurality of R 3 's may be the same or different. |