| abstract |
An object of the present invention is to provide a resist composition capable of producing a resist pattern having excellent CD uniformity. (A) a resin that is insoluble or hardly soluble in an aqueous alkali solution and can be dissolved in an aqueous alkaline solution by the action of an acid; (B) an acid generator having a structure that is cleaved by the action of an alkaline developer; and (D) A resist composition containing a compound represented by formula (I). [Wherein, R 1 and R 2 are each independently a hydrocarbon group having 1 to 12 carbon atoms, an alkoxy group having 1 to 6 carbon atoms, an acyl group having 2 to 7 carbon atoms, or an acyloxy group having 2 to 7 carbon atoms. Group, a C2-C7 alkoxycarbonyl group, a nitro group or a halogen atom. m and n each independently represents an integer of 0 to 4, and when m is 2 or more, the plurality of R 1 are the same or different, and when n is 2 or more, the plurality of R 2 are the same or different. . ] [Selection figure] None |